Magnetoresistive head and a method for manufacturing of the same

A method of manufacturing a magnetoresistive reproducing head comprising the steps of:

• forming a lower magnetic shield on a substrate;
• forming a lower gap film on said lower magnetic shield;
• forming a magnetoresistive film and a lead layer on said lower gap film;
• forming a first layer photo-resist pattern with a distance above said lead layer;
• etching said lead layer by using the photo-resist pattern;
• forming a second layer photo-resist pattern on said magnetoresistive film removed with said lead layer and said first layer photo-resist pattern;
• etching said magnetoresistive film by using said first layer and said second layer photo-resist patterns, thereby forming a domain control film and an outer lead layer to a portion where said magnetoresistive film has been removed;
• removing said first layer and said second layer photo-resist patterns;
• forming an upper gap layer above said magnetoresistive film, said lead layer and said outer lead layer;
• forming an upper magnetic shield on said upper gap film;
• and
• forming an inductive recording head having:
• a lower magnetic layer and an upper magnetic layer formed on said upper magnetic shield by way of an insulator film;
• and a coil disposed between said lower magnetic film and said upper magnetic film by way of a magnetic gap and an insulation film.

A method of manufacturing a magnetoresistive reproducing head comprising the steps of:

• forming a magnetoresistive film having an anti-ferromagnetic film, a pinned layer, an electroconductive non-magnetic layer and a free layer above a lower gap film;
• forming an anti-ferromagnetic film and a lead layer on the free layer of said magnetoresistive film;
• forming a first layer photo-resist pattern at a distance above said lead layer;
• etching said lead layer and said anti-ferromagnetic film by using the photo-resist pattern;
• forming a second layer photo-resist pattern on said magnetoresistive film where said lead layer and said anti-ferromagnetic film has been removed and said first layer photo-resist pattern;
• etching said magnetoresistive film by using said first layer and said second layer photo-resist patterns, thereby forming a domain control film and an outer lead layer to a portion where said magnetoresistive film has been removed;
• removing said first layer and said second layer photo-resist patterns;
• and
• forming an upper gap film above said magnetoresistive film, said lead layer and said outer lead layer.

A method of manufacturing a magnetoresistive reproducing head comprising the steps of:

• forming a lower magnetic shield on a substrate;
• forming a lower gap film on said lower magnetic shield;
• forming a magnetoresistive film, an anti-ferromagnetic film and a lead layer above said lower gap film;
• forming a first layer photo-resist pattern at a distance above said lead layer;
• etching said lead layer and said anti-ferromagnetic film by using the photo-resist pattern;
• forming a second layer photo-resist pattern on said magnetoresistive film where said lead layer and said anti-ferromagnetic film have been removed and said first layer photo-resist pattern;
• etching said magnetoresistive film by using said first layer and said second layer photo-resist patterns, thereby forming a domain control film and an outer lead layer to a portion where said magnetoresistive film has been removed;
• removing said first layer and said second layer photo-resist patterns;
• forming an upper gap film above said magnetoresistive film, said lead layer and said outer lead layer;
• forming an upper magnetic shield above said upper gap film;
• and
• forming an inductive recording head having:
• a lower magnetic layer and an upper magnetic layer formed on said upper magnetic shield by way of an insulator film;
• and a coil disposed between said lower magnetic film and said upper magnetic film by way of a magnetic gap and an insulation film.

A magnetoresistive reproducing head comprising:

• a lower magnetic shield stacked on a substrate;
• a lower gap film, a magnetoresistive film;
• domain control films disposed on both ends of said magnetoresistive film;
• lead layers formed on said domain control films and the both ends of said magnetoresistive film each with a riding amount of 100 nm or less in right-to-left symmetry;
• an upper gap film formed above said lead layer and said magnetoresistive film;
• and
• an upper magnetic shield formed on said upper gap film.

A magnetoresistive head comprising:

• a magnetoresistive reproducing head including:
• a lower magnetic shield stacked on a substrate;
• a lower gap film;
• a magnetoresistive film;
• domain control films disposed on both ends of said magnetoresistive film;
• lead layers formed on said domain control films and the both ends of said magnetoresistive film each with a riding amount of 100 nm or less in right-to-left symmetry;
• an upper gap film formed above said lead layer and said magnetoresistive film;
• and an upper magnetic shield formed on said upper gap film, and
• forming an inductive recording head having:
• a lower magnetic layer and an upper magnetic layer formed on said upper magnetic shield of said magnetoresistive reproducing head by way of an insulator film;
• and a coil disposed between said lower magnetic film and said upper magnetic film by way of a magnetic gap and an insulation film.