Multi-beam exposure apparatus using a multi- axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device

An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams, comprising a multi-axis that comprises:

• a plurality of magnetic conductive member arranged to be substantially parallel to each other, said magnetic conductive members having a plurality of openings;
• and
• a non-magnetic conductive member provided between said plurality of magnetic conductive members, said non-magnetic conductive member having a plurality of through holes,
• wherein said plurality of openings of said magnetic conductive members and said plurality of through holes of said non-magnetic conductive members forming together a plurality of lens openings operable to converge said plurality of electron beams independently of each other, by allowing said plurality of electron beams to pass therethrough, respectively.