Voltammetric reference electrode calibration

A method for calibrating the potential of a test reference electrode used for voltammetric analysis of a plating bath, comprising the steps of:

• measuring the current response to a time-dependent potential applied by means of a counter electrode to a working electrode relative to a standard reference electrode in a plating solution such that metal is plated onto and then anodically stripped from the working electrode surface;
• measuring the current response to the time-dependent potential applied by means of a counter electrode to the working electrode relative to the test reference electrode in the plating solution;
• and
• comparing the working electrode potentials applied relative to the standard reference electrode and the test reference electrode at the zero-current point corresponding to the crossover from metal plating to metal stripping to determine the difference in potential between the standard reference electrode and the test reference electrode.

A method for calibrating the potential of a test reference electrode used for voltammetric analysis of a plating bath, comprising the steps of:

• (1) measuring the current response to a time-dependent potential applied to a working electrode relative to a test reference electrode in a plating solution such that metal is plated onto and then anodically stripped from the working electrode surface;
• (2) repeating step (1) at a later time;
• and
• (3) comparing the working electrode potentials applied in steps (1) and (2) at a predetermined stage in the current response to determine the change in the potential of the test reference electrode with time.

A method for calibrating the potential of a test reference electrode used for voltammetric analysis of a plating bath, comprising the steps of:

• measuring the current response to a first time-dependent potential applied to a working electrode relative to a standard reference electrode in a first plating solution such that metal is plated onto and then anodically stripped from the working electrode surface;
• measuring the current response to a second time-dependent potential applied to the working electrode relative to the test reference electrode in a second plating solution such that metal is plated onto and then anodically stripped from the working electrode surface;
• and
• comparing the working electrode potentials applied relative to the standard reference electrode and the test reference electrode at a predetermined stage in the current response to determine the difference in potential between the standard reference electrode and the test reference electrode.