Cleaning apparatus for semiconductor wafer

A cleaning apparatus for a semiconductor wafer comprising:

• a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, the inner container being communicated to the outer container through the upper opening;
• cleaning liquid supply conduits for supplying a hydrofluoric-acid-containing water, an ozone-containing water, a hydrogen-containing water and a purified water into the inner container;
• an inner container drain conduit for draining liquids from the inner container;
• gas supply conduits for supplying an inactive gas, an ozone gas and a solvent-containing gas into the inner container;
• an exhaust pipe for exhausting the gases from the double container, and
• an outer container drain conduit for draining the liquids spilled from the inner container to the outer container.

A cleaning apparatus for a semiconductor wafer comprising:

• a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, the inner container being communicated to the outer container through the upper opening;
• cleaning liquid supply conduits for supplying a hydrofluoric-acid-containing water, an ozone-containing water, a hydrogen-containing water and a purified water into the inner container;
• an inner container drain conduit for draining the liquid from the inner container;
• gas supply conduits for supplying an inactive gas, an ozone gas and a solvent-containing gas into the inner container;
• an exhaust pipe for exhausting the gases from the double container, and
• an outer container drain conduit for draining the liquids spilled from the inner container to the outer container
• wherein each of the cleaning liquid supply conduits, the inner container drain conduit, the gas supply conduits and the exhaust pipe has a valve which is opened and closed by a controller, thereby cleaning the substrate and drying the substrate.