Laser drilled surfaces for substrate processing chambers
AssigneeApplied Materials, Inc.
InventorsHong Wang, Yongxiang He, Yixing Lin, Edwin C. Weldon, Clifford Stow
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsHong Wang, Yongxiang He, Yixing Lin, Edwin C. Weldon, Clifford Stow
Estimating the term…
A substrate processing chamber has a component having a surface that is exposed inside the chamber. The exposed surface can have a pattern of recesses that are spaced apart from one another, each recess having an opening, sidewalls, and a bottom wall. The recesses are formed by directing a pulsed laser beam onto a position on a surface of the structure for a time sufficiently long to vaporize a portion of the structure at that position. The component can also be a gas distributor having an enclosure with plurality of laser drilled gas outlets having first and second openings with different diameters to reduce an ingress of a plasma into the enclosure. The laser drilled gas outlets can also have rounded edges.
A component for a substrate processing chamber, the component comprising a structure having a surface that is at least partially exposed in the chamber, the surface having a pattern of laser drilled recesses that are spaced apart from one another, each recess having an opening, sidewalls, and a bottom wall.
A method of fabricating a component for a substrate processing chamber, the method comprising:
A process gas distributor for distributing a process gas into a substrate processing chamber, the gas distributor comprising:
A process gas distributor for distributing a process gas into a substrate processing chamber, the gas distributor comprising:
A kit for a substrate processing chamber, the kit comprising a plurality of components, each component comprising a structure having a surface that is at least partially exposed in the chamber, the surface having a pattern of laser drilled recesses that are spaced apart from one another, each recess having an opening, sidewalls, and a bottom wall.
A kit for a substrate processing chamber, the kit comprising a plurality of components that include a deposition ring, cover ring, upper gas shield, and lower gas shield, each component comprising a structure having a surface that is at least partially exposed in the chamber, the surface being substantially entirely covered with a pattern of laser drilled recesses that are spaced apart from one another, each recess having an opening, sidewalls, and a bottom wall.
Dependencies are inferred from the claim text.