Improved chemical mechanical polishing of nickel phoshorous alloys
AssigneeSaint-Gobain Ceramics & Plastics, Inc.
InventorsDouglas Edwin Ward, David Peter Solomos
Life of this patent
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Abstract
CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.
Claims29
A CMP formulation which comprises a dispersion of abrasive particles with particle sizes from 15 to 80 nanometers and selected from the group consisting of silica, alumina, titania, ceria, zirconia and mixtures thereof dispersed in a formulation having a pH of from 2.4 to 2.6 comprising:
- a. an oxidant;
- b. a moderator of the action of the oxidizing agent which comprises a phosphate or phosphite group;
- c. a first accelerant comprising phosphonate groups;
- d. a second accelerant comprising amine or ammonium groups;
- and
- e. water.
A process for the chemical-mechanical planarization of the surface of a nickel/phosphorus alloy containing from 9 to 12% of phosphorus which comprises polishing the surface in the presence of a slurry comprising a dispersion of abrasive particles with particle sizes from 15 to 50 nanometers and selected from the group consisting of silica, alumina, titania, ceria, zirconia and mixtures thereof dispersed in a formulation having a pH of from 2.4 to 2.6 comprising:
- a. an oxidant;
- b. a moderator of the action of the oxidizing agent which comprises a phosphate or phosphite group;
- c. a first accelerant comprising phosphonate groups;
- d. a second accelerant comprising amine or ammonium groups;
- and
- e. water.
A process for the chemical-mechanical planarization of the surface of a nickel/phosphorus alloy containing from 9 to 12% of phosphorus which comprises polishing the surface in the presence of a slurry comprising a dispersion of abrasive particles with particle sizes from 15 to 50 nanometers and selected from the group consisting of silica, alumina, titania, ceria, zirconia and mixtures thereof dispersed in a formulation having a pH of from 2.4 to 2.6 comprising:
- f. an oxidant;
- g. a moderator of the action of the oxidizing agent which comprises a phosphate or phosphite group;
- h. a first accelerant comprising phosphonate groups;
- i. a second accelerant comprising amine or ammonium groups;
- and
- j. water.
Dependencies are inferred from the claim text.