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US 2003/0171070 A1Published application
Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
AssigneeApplied Materials, Inc., a Delaware corporation
InventorRobert D. Tolles
Life of this patent
Estimating the term…
Abstract
The polishing pad for a chemical mechanical polishing apparatus and method of making the same has a polishing pad with a bottom layer, a polishing surface on a top layer and a transparent sheet of material interposed between the two layers. Slurry from the chemical mechanical polishing process is prevented from penetrating the impermeable transparent sheet to the bottom layer of the polishing pad.
Claims12
A polishing pad for use with a polishing fluid comprising:
- a polishing layer and a window in an opening through the polishing layer, the undersurfaces of which are covered by an underlying fluid impermeable layer;
- an adhesive on the fluid impermeable layer forming respective bond seals with the polishing layer and the window to resist wetting of an interface between the adhesive and each of, the polishing layer and the window and the fluid impermeable layer;
- the fluid impermeable layer spanning the polishing layer;
- the fluid impermeable layer being optically transmissive and spanning across the window and the opening;
- and
- the fluid impermeable layer being a continuous barrier to leakage of polishing fluid.
3 more elements
A polishing pad for use with a polishing fluid comprising:
- a polishing layer and a window in an opening through the polishing layer, the undersurfaces of which are covered by an underlying fluid impermeable layer;
- an adhesive on the fluid impermeable layer forming respective bond seals with the polishing layer and the window;
- the fluid impermeable layer spanning the polishing layer;
- the fluid impermeable layer being optically transmissive and spanning across the window and the opening;
- and
- the fluid impermeable layer being a continuous barrier to leakage of polishing fluid.
3 more elements
A polishing pad for use with a polishing fluid comprising:
- a polishing layer and a window in an opening through the polishing layer, the undersurfaces of which are covered by an underlying fluid impermeable layer having an upper surface;
- an adhesive layer on said upper surface of the fluid impermeable layer that adheres said upper surface to said undersurfaces of the polishing layer and the window;
- the fluid impermeable layer spanning the polishing layer;
- the fluid impermeable layer being optically transmissive and spanning across the window and the opening;
- and
- the fluid impermeable layer being a continuous barrier to leakage of polishing fluid.
3 more elements
Dependencies are inferred from the claim text.