Web lift system for chemical mechanical planarization
AssigneeApplied Materials, Inc.
InventorsJohn M. White, Phillip R. Sommer, Sasson Somekh
Life of this patent
Estimating the term…
Abstract
Generally, a method and system for lifting a web of polishing material is provided. In one embodiment, the system includes a platen that has a first lift member disposed adjacent to a first side and a second lift member disposed adjacent to a second side. The platen is adapted to support the web of polishing media that is disposed between the first and the second lift members. A method includes supporting a web of polishing media on a platen between a first lift member and a second lift member and moving at least the first lift member or the second lift member to an extended position relative the platen that places the web in a spaced-apart relation with the platen.
Claims40
A web lift system for lifting a web of polishing material comprising:
- a platen having an upper support surface for supporting a web of polishing material during processing;
- and
- a first lift member coupled to a first side of the platen;
- the first lift member having a retracted position and an extended position relative to the platen, wherein the first lift member in the extended position lifts the web of polishing material from the platen.
A web lift system for lifting a web of polishing material comprising:
- a platen;
- a web of polishing material having a first portion disposed on an upper surface of the platen;
- and
- a first roller coupled to a first side of the platen disposed lateral to the upper surface and having the web of polishing material passing thereover;
- the first roller having a first position that maintains the first portion of the web disposed on the platen and a section position that places the first portion of the web and platen in a spaced-apart relation.
A web lift system comprising:
- a platen adapted to support a web of polishing material;
- a first member disposed adjacent and coupled to the platen, the member adapted to support the web;
- and
- an actuator coupled to the platen and the first member, wherein the actuator moves the first member to an extended position that places the web in a spaced-apart relation to the platen.
A web lift system comprising:
- a platen adapted to support a web of polishing material;
- a first member disposed adjacent to the platen, the member adapted to support the web;
- an actuator coupled to the platen and the first member, wherein the actuator moves the first member to an extended position that places the web in a spaced-apart relation to the platen;
- a second member disposed adjacent the platen opposite the first member, the second member adapted to support the web;
- and
- a biasing means coupled between the platen and the second member.
A processing system for processing substrates comprising:
- one or more webs of polishing material;
- one or more polishing heads each adapted to retain the substrate while moving the substrate relative a respective web in a polishing pattern;
- one or more platens adapted to support a respective web of polishing material;
- a first lift member coupled to a first side of each platen;
- and
- a second lift member coupled to a second side of each platen, wherein at least one of the lift members is movable between a retracted and an extended position relative to the platen, the extended position adapted to place the web in a spaced-apart relation with the platen.
A method for moving a web of polishing material comprising the steps of:
- supporting a web of polishing material on a platen between a first member and a second member;
- and
- moving at least one of the first or the second members to an extended position relative the platen that places the web in a spaced-apart relation with the platen.
A method for moving a web of polishing material comprising the steps of:
- polishing a first substrate on a web of polishing material support on a platen;
- and
- mechanically placing the web of polishing material and the platen in a spaced-apart relation after polishing the substrate.
The method of claim 38, wherein the step of mechanically separating further comprises:
- actuating a first roller guiding the web of polishing material onto an upper surface of the platen away from the platen.
A method for moving a web of polishing material comprising the steps of:
- mechanically spacing a web of polishing material from a platen adapted to support the web of polishing material during processing;
- advancing the mechanically spaced web of polishing material across the platen;
- returning the web of polishing material into contact with the platen;
- and
- polishing a substrate on the platen.
Dependencies are inferred from the claim text.