Plasma processing apparatus and method

A plasma processing system for processing a workpiece by using plasma generated in a chamber, comprising:

• a light transmissive member disposed in the chamber, the workpiece being disposed inside said light transmissive member;
• and
• light receiving means mounted on the chamber for receiving light inside said light transmissive member,
• wherein an operation of the system is controlled by using data detected from light inside said light transmissive member before and after processing the workpiece.

A plasma processing system for processing a workpiece by using plasma generated in a chamber, comprising:

• a light transmissive member disposed in the chamber, the workpiece being disposed inside said light transmissive member;
• and
• light receiving means mounted on the chamber for receiving light inside said light transmissive member,
• wherein a state of generation of plasma is detected by using data detected from light inside said light transmissive member before processing the workpiece and data detected from light inside said light transmissive member generated during processing the workpiece.

A plasma processing system for processing a workpiece by using plasma generated in a chamber, comprising:

• a light transmissive member disposed in the chamber, the workpiece being disposed inside said light transmissive member;
• and
• light receiving means mounted on the chamber for receiving light inside said light transmissive member,
• wherein generation of plasma is controlled by using data detected from light inside said light transmissive member before and after processing the workpiece.

A plasma processing method of processing a workpiece by using plasma generated in a chamber, the workpiece being disposed inside a light transmissive member disposed in the chamber, comprising the steps of:

• detecting and storing first data of light inside the light transmissive member before processing the workpiece;
• detecting second data of light inside the light transmissive member generated during processing the workpiece;
• and
• detecting a state of processing the workpiece by using the second data added to the stored first data.

A plasma processing method of processing a workpiece through reaction with plasma generated in a chamber, the workpiece being disposed inside a light transmissive member disposed in the chamber, comprising the steps of:

• detecting and storing first data of light inside the light transmissive member before processing the workpiece;
• detecting second data of light inside the light transmissive member generated during processing the workpiece;
• and
• detecting the reaction by using the second data added to the stored first data.

A plasma processing method of processing a workpiece by using plasma generated in a chamber, the workpiece being disposed inside a light transmissive member disposed in the chamber, comprising the steps of:

• detecting and storing first data of light inside the light transmissive member before processing the workpiece;
• detecting second data of light inside the light transmissive member generated after processing the workpiece;
• and
• controlling an operation of the system by using the second data added to the stored first data.

A plasma processing method of processing a workpiece through reaction with plasma generated in a chamber, the workpiece being disposed inside a light transmissive member disposed in the chamber, comprising the steps of:

• detecting and storing first data of light inside the light transmissive member before processing the workpiece;
• detecting second data of light inside the light transmissive member generated after processing the workpiece;
• and
• diagnosing the system by comparing the second data with the stored first data.