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AssigneeASML Masktools B.V.
InventorsMarkus Franciscus Antonius Eurlings, Jang Fung Chen, Duan-Fu Stephen Hsu
Estimating the term…
A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus. The method includes the steps of: (1) defining features to be printed on the substrate; (2) determining which of the features require assist features to be disposed adjacent thereto in order for the features to be printed within defined resolution limits; (3) generating a mask containing the features to be printed and the assist features; (4) performing a first illumination process so as to print the features on the substrate, the first illumination process resulting in the partial printing of the assist features on the substrate; and (5) performing a second illumination process so as to reduce the amount of the assist features printed on the substrate; the second illumination process entails the step of performing a quadrapole illumination.
A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus, said method comprising the steps of:
A device manufacturing method comprising the steps of:
Dependencies are inferred from the claim text.