Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface
AssigneeRonal Systems Corporation
InventorRonny Bar-Gadda
Life of this patent
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Abstract
Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radicals to form the chemical species at the point of use.
Claims26
In apparatus for generating a chemical species for use in processing a semiconductor wafer in a reaction chamber:
- a source of free radicals, and means for combining free radicals from the source to form the chemical species in the chamber in close proximity to the wafer.
In apparatus for generating a chemical species at a point of use where a workpiece is to be processed with the species:
- a source of free radicals, and means for combining free radicals from the source to form the chemical species at the point of use.
In a method of generating a chemical species for use in processing a semiconductor wafer in a reaction chamber, the steps of:
- creating free radicals, and combining the free radicals to form the chemical species in the chamber in close proximity to the wafer.
In a method of generating a chemical species at a point of use where a workpiece is to be processed with the species, the steps of:
- creating free radicals, and combining the free radicals to form the chemical species at the point of use.
Dependencies are inferred from the claim text.