Multi-technique thin film analysis tool

A thin film analysis system for analyzing a sample coating, the thin film analysis system comprising:

• a first microfocus x-ray tube for generating a first source x-ray beam;
• a position-sensitive x-ray detector;
• a first x-ray beam focusing system for focusing the first source x-ray beam onto the sample coating, the first source x-ray beam being configured such that a first portion of the first source x-ray beam is reflected onto the position-sensitive detector by the sample coating;
• and
• a first x-ray detector, the first x-ray detector comprising a wavelength-dispersive x-ray spectrometer.

A thin film analysis system for analyzing a sample coating, the thin film analysis system comprising:

• a first microfocus x-ray tube for generating a first source x-ray beam;
• a position-sensitive detector;
• a first x-ray beam focusing system for focusing the first source x-ray beam onto the sample coating, the first source x-ray beam being configured such that a first portion of the first source x-ray beam is reflected onto the position-sensitive detector by the sample coating;
• an electron beam (e-beam) generator for directing an e-beam at the sample coating to cause the sample coating to emit a first set of characteristic x-rays;
• and
• a first x-ray detector, the first x-ray detector being configured to measure a first portion of the first set of characteristic x-rays.

A method for analyzing a sample coating, the method comprising:

• focusing a source x-ray beam onto the sample coating, such that a first portion of the source x-ray beam is reflected by the sample coating and a second portion of the source x-ray beam is absorbed by the sample coating, wherein the second portion of the source x-ray beam causes the sample coating to emit a set of characteristic x-rays;
• measuring an interference pattern created by the first portion of the source x-ray beam using a position-sensitive detector;
• and
• measuring a first portion of the set of characteristic x-rays using a first wavelength-dispersive x-ray spectrometer.

A method for analyzing sample coatings, the method comprising:

• focusing a source x-ray beam onto a first sample coating to cause the first sample coating to emit a first set of characteristic x-rays;
• measuring a first portion of the first set of characteristic x-rays using a first x-ray detector;
• directing an electron beam (e-beam) at a second sample coating to cause the second sample coating to emit a second set of characteristic x-rays;
• and
• measuring a first portion of the second set of characteristic x-rays using the first x-ray detector.

A method for analyzing a sample coating, the method comprising:

• focusing a source x-ray beam onto the sample coating and directing an electron beam (e-beam) in rapid succession with each other;
• measuring an interference pattern created by a portion of the source x-ray beam reflected by the sample coating;
• and
• using an x-ray detector, measuring a set of characteristic x-rays emitted by the sample coating in response to the e-beam.

A thin film analysis system for analyzing a sample coating, the thin film analysis system comprising:

• means for generating a source x-ray beam;
• means for focusing the source x-ray beam onto the sample coating to cause the sample coating to emit a first set of characteristic x-rays;
• means for directing an electron beam (e-beam) at the sample coating to cause the sample coating to emit a second set of characteristic x-rays;
• and
• means for measuring a first portion of the first set of characteristic x-rays and a first portion of the second set of characteristic x-rays.

A thin film analysis system for analyzing a sample coating, the thin film analysis system comprising:

• means for generating a first source x-ray beam;
• means for focusing the first source x-ray beam onto the sample coating, the first source x-ray beam being configured such that a first portion of the first source x-ray beam is reflected by the sample coating and a second portion of the first source x-ray beam is absorbed by the sample coating;
• means for resolving an interference pattern created by the first portion of the first source x-ray beam after being reflected by the sample coating;
• and
• a first x-ray detector, the first x-ray detector comprising a wavelength-dispersive x-ray spectrometer configured to measure a first portion of a set of characteristic x-rays emitted by the sample coating in response to the second portion of the first source x-ray beam.

A thin film analysis system for analyzing a sample coating, the thin film analysis system comprising:

• means for generating a first source x-ray beam;
• means for focusing the first source x-ray beam onto the sample coating, the first source x-ray beam being configured such that a first portion of the first source x-ray beam is reflected by the sample coating;
• means for resolving an interference pattern created by the first portion of the first source x-ray beam after being reflected by the sample coating;
• means for directing an electron beam (e-beam) at the sample coating to cause the sample coating to emit a first set of characteristic x-rays;
• and
• means for measuring a first portion of the first set of characteristic x-rays.