Laser irradiation apparatus and exposure method using laser irradiation apparatus

Abstract

A laser irradiation apparatus excellent in an irradiation efficiency and an irradiation quality, and an exposure method using the laser irradiation apparatus are provided, the apparatus comprising an optical unit including a semiconductor laser array in which a plurality of semiconductor lasers emitting laser beams are disposed, light propagation means for propagating the laser beams to deliver a propagated laser beam, and an optical device including a mask, on which irradiation patterns for irradiating the propagated laser beam are formed, and an image forming optical element for forming an image of the propagated laser beam irradiated from the irradiation patterns of the mask. The apparatus enables simultaneous scanning of a plurality of laser beams with uniform light intensity distribution.

Dependencies are inferred from the claim text.