Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

A polymer formed by polymerizing a compound having the formula

• 15
• with a compound having the formula
• 16
• wherein:
• each R is individually selected from the group consisting of —OH, —NH2, hydrogen, aliphatics, and phenyls, at least one R on each ring of (I) being —NH2;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

In a composition for use in photolithographic processes wherein the composition comprises a polymer dissolved or dispersed in a solvent system, the improvement being that said polymer comprises recurring monomers having the formulas

• 17
• wherein:
• each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

In a composition for use in photolithographic processes wherein the composition comprises a polymer dissolved or dispersed in a solvent system, the improvement being that said polymer is a copolymer of a compound having the formula

• 18
• and a compound having the formula
• 19
• wherein:
• each R is individually selected from the group consisting of —OH, —NH2, hydrogen, aliphatics, and phenyls, at least one R on each ring of (I) being —NH2;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

The combination of:

• a substrate having a surface;
• and
• an anti-reflective layer adjacent said surface, said anti-reflective layer being formed from a composition comprising a polymer dissolved or dispersed in a solvent system, said polymer comprising recurring monomers having the formulas
• 20
• wherein:
• each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

The combination of:

• a substrate having a surface;
• and
• an anti-reflective layer adjacent said surface, said anti-reflective layer being formed from a composition comprising a polymer dissolved or dispersed in a solvent system, said polymer being a copolymer of a compound having the formula
• 21
• and a compound having the formula
• 22
• wherein:
• each R is individually selected from the group consisting of —OH, —NH2, hydrogen, aliphatics, and phenyls, at least one R on each ring of (I) being —NH2;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

A method of using a composition in photolithographic processes, said method comprising the step of applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising a polymer dissolved or dispersed in a solvent system, said polymer comprising recurring monomers having the formulas

• 23
• wherein:
• each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

A method of using a composition in photolithographic processes, said method comprising the step of applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising a polymer dissolved or dispersed in a solvent system, said polymer being a copolymer of a compound having the formula

• 24
• and a compound having the formula
• 25
• wherein:
• each R is individually selected from the group consisting of —OH, —NH2, hydrogen, aliphatics, and phenyls, at least one R on each ring of (I) being —NH2;
• and
• L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens.

A method of using a composition in photolithographic processes, said method comprising the steps of:

• applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising a polymer dissolved or dispersed in a solvent system, said polymer comprising recurring monomers having the formulas
• 26
• where each of
• 27
• individually represent an aryl or aliphatic group;
• and
• exposing at least a portion of said layer to DUV light.