Method for patterning, method for forming film, patterning apparatus, film formation apparatus, electro-optic apparatus and method for manufacturing the same, electronic equipment, and electronic apparatus and method for manufacturing the same

A method for patterning comprising the steps of arranging a substrate in a vacuum atmosphere adjusted at a high degree of vacuum, and discharging a material into the vacuum atmosphere from at least one of a plurality of nozzles connected to a material supply source so as to form a pattern made of the material on the substrate.

A method for forming a film, comprising:

• a first step of discharging a material into a vacuum atmosphere from a nozzle connected to a material supply source so as to form a film containing the material or a film containing the material as the precursor, on a first region of a substrate;
• and
• a second step of discharging the material into the vacuum atmosphere from the nozzle so as to form a film containing the material or a film containing the material as the precursor, on a second region different from the first region.

A method for forming a film, comprising the steps of:

• discharging a material into a vacuum atmosphere from a first nozzle connected to a material supply source so as to form a film containing the material or a film containing the material as the precursor, on a first region of a substrate;
• and at the same time
• discharging the material into the atmosphere from a second nozzle connected to the material supply source so as to form a film containing the material or a film containing the material as the precursor, on a second region different from the first region.

A method for forming a film, comprising the steps of:

• discharging a first material into a vacuum atmosphere from a first nozzle connected to a first material supply source so as to form a film containing the first material or a film containing the material as the precursor, on a first region of a substrate;
• and at the same time
• discharging a second material into the atmosphere from a second nozzle connected to a second material supply source so as to form a film containing the second material or a film containing the material as the precursor, on a second region different from the first region.

A patterning apparatus comprising a vacuum chamber capable of being adjusted at a high degree of vacuum, a nozzle connected to a material supply source while being attached to the vacuum chamber so as to supply the material from the material supply source into the vacuum chamber, and a substrate stage arranged in the vacuum chamber so as to hold and fix a substrate, wherein the nozzle or the substrate stage comprises a movement mechanism for moving relative positions of the nozzle and the substrate stage.

A patterning apparatus comprising a vacuum chamber capable of being adjusted at a high degree of vacuum, a plurality of nozzles connected to a material supply source while being attached to the vacuum chamber so as to supply a material from the material supply source into the vacuum chamber, and a substrate stage arranged in the vacuum chamber so as to hold and fix a substrate, wherein the nozzle or the substrate stage comprises a movement mechanism for moving relative positions of the nozzle and the substrate stage.