Pattern forming method and display device manufactured using same

Abstract

A pattern forming method of the present invention for forming a predetermined pattern on a photosensitive resin film by (i) layering the photosensitive resin film on an inorganic thin film with which a plastic substrate is coated and (ii) exposing the photosensitive resin film via a photomask having the predetermined pattern in an exposing step is characterized by including the step of heating the plastic substrate having the inorganic thin film before the exposing step, a time from an end of the heating step to a start of the exposing step being managed to be not less than a predetermined time, in accordance with an asymptotic contracting behavior after the end of the heating step of the plastic substrate having the inorganic thin film. With this, it is possible to provide a pattern forming method capable of forming a plurality of patterns on a plastic substrate with high accuracy of superposition, and a display device manufactured using the same.

Dependencies are inferred from the claim text.