Photosensitive composition for photoresist manufacture
AssigneeRhodia Chimie
InventorsEvelyne Prat, Mathias Destarac
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Abstract
The invention concerns a novel photosensitive composition for photoresist and a system comprising a substrate and a photoresist obtained from said novel composition. The photosensitive composition for photoresist comprises a copolymer with hydrophobic blocks whereof at least one block is an hydrophobic block capable of generating a hydrophilic block and comprising at its end a group selected among dithioesters, thioesters-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating under the effect of a radiation an active species reacting with the hydrophobic block to generate the hydrophilic block.
Claims19
Photosensitive composition for photoresists which comprises a copolymer with hydrophobic blocks, at least one block of which is a hydrophobic block capable of generating a hydrophilic block, which comprises, at its end, a group chosen from dithioesters, thioethers-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating, under the effect of radiation, an active species which reacts with the hydrophobic block to generate the hydrophilic block.
Composition according to any one of the preceding claims, in which the ends of the block copolymer chosen from dithioesters, thioethers-thiones, dithiocarbamates and xanthates are cleaved before being incorporated in the photoresist composition.
System comprising a substrate and a film capable of being obtained from the composition as defined according to any one of the preceding claims.
Dependencies are inferred from the claim text.