Developing method and developing unit

A developing method for performing development treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein a charged member electrically charged to an opposite polarity to that of a zeta potential of insoluble substances floating in said developing solution is brought into contact with said developing solution.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein a charged member electrically charged to the same polarity as that of a zeta potential of insoluble substances floating in said developing solution is brought into contact with the developing solution on said substrate, and said charged member is moved.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein a potential gradient is given to said substrate supplied with the developing solution, and a potential of said substrate is cocentrically changed with time.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein said developing solution is supplied onto the resist film while the resist film is set to a room temperature or higher.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein said developing solution is supplied onto the resist film while the substrate is set to a room temperature or higher.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein an ionic surfactant having a predetermined polarity is added to said developing solution, and said ionic surfactant is made to adhere to insoluble substances floating in said developing solution and the surface of said substrate.

A developing method for performing developing treatment of a substrate by applying a resist solution on a surface of the substrate to form a resist film and supplying a developing solution onto said formed resist film,

• wherein said resist solution is applied to the surface of the surface, with an ionic surfactant in a predetermined polarity being mixed in said resist solution.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein an ionic surfactant in a predetermined polarity is supplied onto a surface of said resist film before said developing solution is supplied.

A developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate,

• wherein, when said resist film has conductivity, a voltage is applied to this resist film to keep this resist film at a potential in the same polarity as that of insoluble substances in the developing solution at least during the development treatment.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a charging unit electrically charging the surface of said substrate to a zeta potential in a predetermined polarity.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising;

• an ion atmosphere supply section supplying a periphery of a substrate with an atmosphere including ions in a predetermined polarity.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a charged member electrically chargeable to a predetermined polarity;
• and
• a charged member carrier carrying said charged member to bring the charged member into contact with the developing solution on the substrate.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a surfactant supply section supplying an ionic surfactant in a predetermined polarity onto said substrate.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a surfactant supply section supplying a nonionic surfactant onto said substrate.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a charging unit electrically charging said developing solution to a zeta potential in a predetermined polarity.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a charged member electrically charged to the same polarity as that of insoluble substances in the developing solution loaded on said resist film;
• and
• a moving member moving said charged member above the substrate.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a heating unit heating said substrate.

A developing unit performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, comprising:

• a mounting table supporting said substrate by clamping;
• and
• a unit applying a voltage to the resist film on the substrate placed on said mounting table.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid liquid is supplied to the substrate at a stage prior to the supply of the developing solution to the substrate after the substrate is coated with the resist.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid liquid is supplied to the substrate after the developing solution is supplied to the substrate.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid liquid is supplied to the substrate when the developing solution is washed away by a cleaning liquid after the developing treatment is performed by supplying the developing solution to the substrate.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid liquid is supplied to the substrate after said developing solution is washed away by a cleaning liquid after the developing treatment is performed by supplying the developing solution to the substrate, and thereafter, the cleaning liquid is supplied again to this substrate for cleaning.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid gas is supplied to the substrate at a stage prior to the supply of the developing solution to the substrate after the resist is applied to the substrate.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid gas is supplied to the substrate after the developing solution is supplied to the substrate.

A developing method for performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and exposed in a predetermined pattern,

• wherein an acid gas is supplied to the substrate after said developing solution is washed away by a cleaning liquid after the developing treatment is performed by supplying the substrate with the developing solution, and thereafter, the cleaning liquid is supplied again to the substrate for cleaning.

A developing unit performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and having undergone exposure, comprising:

• an acid liquid supply section supplying an acid liquid to the substrate.

A developing unit performing developing treatment of a substrate by supplying a developing solution to the substrate coated with a resist and having undergone exposure, comprising:

• an acid gas supply section supplying an acid gas to the substrate.

A developing unit performing a developing step of supplying a developing solution to a substrate and thereafter, a cleaning step of supplying a cleaning liquid onto the substrate, comprising:

• a pH adjusting liquid supply section supplying a pH adjusting liquid onto the substrate in order to adjust a pH value of a liquid on the substrate during said cleaning step.