Thin film coating having niobium-titanium layer
AssigneeCardinal CG Company
InventorsKlaus Hartig, Annette J. Krisko
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Abstract
The invention provides niobium-titanium films, coatings (e.g., low-emissivity coatings) comprising one or more niobium-titanium films, and substrates bearings such coatings. Methods of depositing niobium-titanium films are also provided.
Claims70
A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly:
- a) a first film layer comprising a transparent dielectric material;
- b) a second film layer comprising an infrared-reflective material;
- c) a third, protective film layer comprising niobium and titanium;
- and
- d) a fourth film layer comprising a transparent dielectric material.
A substrate bearing a low-emissivity coating that includes one or more infrared-reflective films, the low-emissivity coating including a protective niobium-titanium layer that is contiguous with a protected infrared-reflective film of the coating.
A transparent substrate having a first index of refraction, the substrate bearing a low-emissivity coating comprising, moving outwardly:
- a) a transparent base layer comprising amorphous material having a second index of refraction that is substantially equal to the first index of refraction of the substrate;
- b) a second film layer comprising a transparent dielectric material;
- c) a third film layer comprising an infrared-reflective material;
- d) a fourth, protective film layer comprising niobium and titanium;
- and
- e) a fifth film layer comprising a transparent dielectric material.
A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly:
- a) a first film layer comprising a transparent dielectric material;
- b) a second film layer comprising an infrared-reflective material;
- d) an intermediate film region comprising at least three film layers;
- f) a sixth film layer comprising an infrared-reflective material;
- g) a seventh film layer comprising a transparent dielectric material;
- wherein the low-emissivity coating includes a protective niobium-titanium layer that is contiguous either to said second film layer or to said sixth film layer.
A substrate bearing a low-emissivity coating, the coating comprising, moving outwardly:
- a) a first film layer comprising an oxide of zinc and tin;
- b) a second film layer comprising an oxide of zinc alone;
- c) a third film layer comprising an infrared-reflective material;
- d) a fourth film layer comprising niobium and titanium formed directly upon the third film layer;
- e) a fifth film layer comprising an oxide of zinc alone;
- f) a sixth film layer comprising an oxide of zinc and tin;
- g) a seventh film layer comprising an oxide of zinc alone;
- h) an eighth film layer comprising an infrared-reflective material;
- i) a ninth film layer comprising niobium and titanium formed directly upon the eighth film layer;
- j) a tenth film layer comprising an oxide of zinc alone;
- k) an eleventh film layer comprising an oxide of zinc and tin;
- and
- l) a twelfth film layer comprising a transparent dielectric material.
A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly from the substrate:
- a) a first film layer comprising an oxide of titanium;
- b) a second film layer comprising an oxide of zinc alone;
- c) a third film layer comprising an infrared-reflective material;
- d) a fourth film layer comprising niobium and titanium formed directly upon the third film layer;
- e) a fifth film layer comprising silicon nitride;
- f) a sixth film layer comprising an oxide of zinc alone;
- g) a seventh film layer comprising an infrared-reflective material;
- h) an eighth film layer comprising niobium and titanium formed directly upon the seventh film layer;
- and
- i) a ninth film layer comprising a transparent dielectric material.
A method of depositing a niobium-titanium layer having abrasion resistance and resistance to color shifting during elevated temperature processing, the method comprising providing a niobium-containing sputtering target and a titanium-containing sputtering target, positioning both targets in a sputtering chamber having a sputtering cavity in which a controlled environment can be established, and delivering electric charge to both targets to sputter niobium and titanium onto a substrate having a major surface oriented toward both targets, thereby depositing niobium-titanium film upon said major surface of the substrate or upon a film layer previously deposited upon said major surface of the substrate.
Dependencies are inferred from the claim text.