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OwnerSatoshi Wakabayashi, Toshio Hasegawainventors
Estimating the term…
The precoat film forming method has the deposition step of feeding processing gas into the film forming device having the loading table structure 18 internally which has the loading table 16 for loading the article W to be processed and depositing the precoat film 22 composed of a TiN film on the surface of the loading table and the stabilization step of exposing and stabilizing the precoat film in NH3 (ammonia) containing gas by keeping the loading table at a temperature higher than the temperature at the deposition step. By doing this, the precoat film is stabilized, thereby even during a period of idling, there is no need to lower the temperature of the loading table and the throughput can be improved. Further, the film forming method for depositing a predetermined film on the surface of the article W to be processed using high-melting point metallic compound gas and reducing gas in the processing container 4 which can be evacuated feeds oxidizing gas into the processing container during or immediately after the film forming process. By doing this, the sheet resistance can be greatly prevented from a change with time.
A precoat film forming method of a film forming device having a loading table for loading an object to be processed internally, comprising:
A precoat film forming method of a film forming device having a loading table for loading an object to be processed internally, comprising:
An idling method of a film forming device having a loading table with a precoat TiN film formed on a surface in a processing container which can be evacuated so as to form a Ti film or a TiN film on an object to be processed, wherein NH3 containing gas is fed into said processing container.
A loading table structure of a film forming device for performing a film forming process for depositing a Ti film or a Ti containing film on an object to be processed, comprising a loading table installed in order to load said object to be processed and a precoat TiN film which is formed on a surface of said loading table and subjected to a stabilization process.
A film forming device for forming a Ti film or a Ti containing film on an object to be processed, comprising:
A film forming method for performing a film forming process of depositing a predetermined film on a surface of an object to be processed using high-melting point metallic compound gas and reducing gas in a processing container which can be evacuated, comprising a step of feeding oxidizing gas into said processing container during or immediately after said film forming process.
Dependencies are inferred from the claim text.