Composition containing a dibenzoylmethane derivative and an alpha-alkylstyrene dimer uv stabilising method
OwnerSerge Forestierinventor
Life of this patent
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Abstract
The invention relates to a cosmetic or dermatological composition, for topical use, in particular for the photoprotection of skin and hair, characterized in that it comprises at least, in a cosmetically acceptable support: (a) from 0.1 to 20% by weight of a UV screening agent of the dibenzoylmethane-based type and (b) from 0.1 to 20% by weight of one specific α-alkylstyrene-based dimer. The invention relates to a novel process for improving the stability of at least one dibenzoylmethane derivative towards UV radiation, which consists in combining with the said dibenzoylmethane derivative an effective amount of at least one specific α-alkylstyrene-based dimer.
Claims24
Cosmetic or dermatological composition, for topical use, characterized in that it comprises at least, in a cosmetically acceptable support:
- (a) from 0.1 to 20% by weight of a UV screening agent of the dibenzoylmethane-based type and
- (b) from 0.1 to 20% by weight of an α-alkylstyrene-based dimer of formula (I) below:
- 11
- in which
- R1 and R2, which may be identical or different, denote hydrogen, OH, NH2, a linear or branched C1-C12 alkyl radical;
- a linear or branched C1-C12 alkoxy radical;
- a linear or branched C1-C12 monoalkylamino radical;
- a linear or branched C1-C12 dialkylamino radical or a water-solubilizing substituent chosen from a carboxylate group, a sulphonate group and an ammonium residue;
- R3 and R4, which may be identical or different, denote a group COOR6, COR6, CONR6R7 or CN;
- R5 denotes a linear or branched C1-C12 alkyl radical;
- R6 and R7, which may be identical or different, denote hydrogen, a linear or branched C1-C12 alkyl radical;
- a linear or branched C2-C10 alkenyl radical;
- a branched or unbranched C3-C10 cycloalkyl radical;
- a branched or unbranched C3-C10 cycloalkenyl radical;
- a C6-C18 aryl or a C4-C7 heteroaryl;
- the said cycloalkyl, cycloalkenyl and aryl groups possibly comprising one or more substituents chosen from halogens, a cyano group, a nitro group, an amino group, a C1-C4 monoalkylamino radical, a C1-C4 dialkylamino radical, a hydroxyl group, a C1-C4 alkyl radical and a C1-C4 alkoxy radical;
- the said cycloalkyl and cycloalkenyl groups possibly comprising one or more hetero atoms (for example O, N or S);
- A denotes O, S or a group NR8;
- R8 denotes hydrogen or a linear or branched C1-C12 alkyl radical;
- B denotes a linear or branched C1-C12 alkylene radical which may comprise one or more substituents chosen from hydroxyl, OC1-C6-acyl, NH2, NH-C1-C6-alkyl, NH-C1-C6-acyl, CN, COOH and COO-C1-C6-acyl;
- a branched or unbranched C4-C12 cycloalkylene radical;
- a C8-C22 aralkylene radical;
- a C9-C21 monooxoaralkylene radical;
- or a group [X]n—Y—;
- at least two of the radicals R1, R2 and R8 may together form a 5- or 6-membered ring with the benzene nucleus to which they are attached;
- X denotes a group —CH2—CH2—Z—, —CH2CH2CH2Z—, —CH(CH3)—CH2—Z—, —CH2—CH2—CH2—CH2—Z— or CH2—CH(CH2CH3)—Z—;
- Y denotes a group —CH2—CH2—, —CH2CH2CH2—, —CH(CH3)—CH2—, —CH2—CH2—CH2—CH2— or —CH2—CH(CH2CH3)—;
- Z denotes O or S;
- n ranges from 1 to 150.
Dependencies are inferred from the claim text.