Method and apparatus for altering the effective mode index of waveguide

A method for modifying light propagation in a waveguide, comprising the steps of:

• providing a Silicon-On-Insulator (SOI) wafer that includes an insulator layer and upper silicon layer, and a waveguide formed at least in part in the upper silicon layer of the SOI wafer, wherein the waveguide guides an optical signal by total internal reflection, and at least one micro-mechanical system (MEMS) having at least one movable component disposed a positive distance away from the waveguide;
• and
• applying a voltage to the MEMS which results in a variation of the distance between the moveable component and the waveguide, which in turn alters an effective index of the waveguide in a location proximate the moveable object, thereby resulting in modification of light propagation in the waveguide.

A method for modifying light propagation in a waveguide, comprising the steps of:

• providing a wafer that includes an insulator layer and upper silicon layer, and a waveguide formed at least in part in the upper silicon layer of the wafer, wherein the waveguide guides an optical signal by total internal reflection, and at least one micro-mechanical system (MEMS) having at least one movable component disposed a positive distance away from the waveguide;
• and
• applying a voltage to the MEMS which results in a variation of the distance between the moveable component and the waveguide, which in turn alters an effective index of the waveguide in a location proximate the moveable object, thereby resulting in modification of light propagation in the waveguide.