Stage apparatus, exposure apparatus and method for exposing substrate plate
AssigneeNikon Corporation
InventorsKenji Nishi, Toru Kiuchi
Life of this patent
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Abstract
The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.
Claims9
A stage apparatus having a movable stage structure body which holds a substrate plate and which is movable on a base structure body, comprising:
- a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said movable stage structure body;
- and
- a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on the base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.
An exposure apparatus comprising a stage apparatus, said stage apparatus having a movable stage structure body being movably supported on a base structure body and holding a photosensitive substrate plate onto which patterns formed on a mask is transcribed, said stage apparatus including:
- a receipt edge orifice disposed at least at a portion of a fluid path which is provided in said movable stage structure body;
- and
- a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on the base structure body at each time of exposing the photosensitive substrate plate and providing or discharging a predetermined-fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.
A method for exposing a substrate plate to transcribe patterns formed on a mask onto said substrate plate by using an exposure light passing through said mask, comprising a step of:
- detachably engaging a receipt edge orifice with a feed edge orifice prior to an exposure operation on a base structure body , said receipt edge orifice being disposed at least at a portion of a fluid path which is provided in a movable stage structure body which is movable on said base structure body, and feed edge orifice being engageable with said receipt edge orifice so as to provide or discharge a predetermined fluid to the receipt edge orifice.
Dependencies are inferred from the claim text.