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US 2003/0164840 A1Published application
High quality antialiased lines with dual sampling pattern
Assignee3Dlabs Inc., Ltd.
InventorGerard O'Driscoll
Life of this patent
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Abstract
Antialiased lines are classified according to their orientation, e.g. as x-major or y-major depending whether the x or y extent of the line is larger. Different subpixel sampling patterns are used for different lines, in accordance with this classification. This permits antialiased rendering to achieve increased visual quality of the line without adding in more sample points.
Claims8
A method for generating antialiased lines, comprising the actions of
- for each respective line, determining which of a plurality of orientation classes that line falls into;
- and
- performing subpixel sampling using one of a plurality of sampling patterns, in dependence on which of said plurality of orientation classes that line falls into.
A method for antialiased rendering, comprising the actions of:
- (a) identifying, for at least one respective line, which one of a limited number of directions is most nearly parallel to said line;
- and
- (b) performing subpixel sampling on said line with a subpixel sampling pattern which has maximal resolution approximately normal to said one direction.
Dependencies are inferred from the claim text.