Induction heating of thin films
AssigneeBoard of Control of Michigan Technological University
InventorsPaul L. Bergstrom, Melissa L. Trombley
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Abstract
A method of performing regional heating of a system having a substrate. The method may include applying a thin film to the system, and controllably energizing a coil positioned near the thin film. The energized coils thereby generate a magnetic flux. The method further includes inducing a current in the thin film with the magnetic flux thereby heating the system.
Claims94
A method of performing regional heating of a system having a substrate, the method comprising:
- applying a thin film to the system;
- controllably energizing a coil positioned near the thin film, the energizing act resulting in a magnetic flux;
- and
- inducing a current in the thin film with the magnetic flux thereby heating the system.
A method of performing regional heating of a system having a substrate, the method comprising:
- applying a thin film to the system;
- and
- generating heat in the thin film thereby heating the system wherein generating the heat includes controllably energizing a coil positioned near the thin film thereby inducing a current in the thin film.
A method of performing regional heating of a system having a substrate, the method comprising:
- patterning a selected region of the system;
- applying a non-dielectric thin film to the selected region;
- passing a current through an inductive coil, thereby producing a flux near the inductive coil;
- and
- controllably inducing a current in the thin film with the flux thereby heating the region of the system.
A method of performing regional heating of a system having a substrate, the method comprising:
- applying a thin film to the system;
- removing a region of the thin film from the system;
- passing a current through an inductive coil thereby producing a flux at the inductive coil;
- and
- controllably inducing a current in the thin film with the flux thereby heating the region of the substrate.
An apparatus for regionally heating a system having a substrate via a thin film, the apparatus comprising:
- a thin film depositor configured to apply the thin film to the system;
- a substrate chamber configured to receive the substrate and hold the system in place;
- and
- an impedance coupler positioned near the substrate chamber, the impedance coupler configured to controllably generate a flux to induce a current in the thin film with the flux thereby heating the system.
Dependencies are inferred from the claim text.