Production and use of octafluoropropane
AssigneeShowa Denko K.K.
InventorsHiromoto Ohno, Toshio Ohi
Life of this patent
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Abstract
Octafluoropropane is produced by a process comprising a step (1) of reacting hexafluoropropene with hydrogen fluoride in a gas phase at a temperature of from 150 to 450° C. in the presence of a fluorination catalyst to obtain 2H-heptafluoropropane and a step (2) of reacting 2H-heptafluoropropane obtained in step (1) with fluorine gas in a gas phase at a temperature of from 250 to 500° C. in the absence of a catalyst to obtain octafluoropropane. High-purity octafluoropropane is obtained which can be used in a process for producing a semiconductor device.
Claims20
A process for producing octafluoropropane, comprising:
- (1) a step of reacting hexafluoropropene with hydrogen fluoride in a gas phase at a temperature of approximately from 150 to 450° C. in the presence of a fluorination catalyst to obtain 2H-heptafluoropropane;
- and
- (2) a step of reacting 2H-heptafluoropropane obtained in step (1) with fluorine gas in a gas phase at a temperature of approximately from 250 to 500° C. in the absence of a catalyst to obtain octafluoropropane.
An octafluoropropane product comprising octafluoropropane having a purity of 99.995 vol % or more.
Dependencies are inferred from the claim text.