Method for fabricating a component, and component having a metal layer and an insulation layer
AssigneeInfineon Technologies AG
InventorsZvonimir Gabric, Werner Pamler, Volker Weinrich
Life of this patent
Estimating the term…
Abstract
A method for improving the adhesion between a noble metal layer and an insulation layer includes configuring a silicon layer between the noble metal layer and the insulation layer. The silicon layer is siliconized and oxidized by a thermal treatment in an oxidative environment, resulting in an oxidized silicide layer with high intermixing of the noble metal and the formed oxide. The relatively large inner surface achieved as a result improves the adhesion between the noble metal layer and the insulation layer.
Claims31
A method for fabricating a component, which comprises:
- applying a noble metal layer to a substrate and subsequently applying a silicon layer to the substrate such that a surface of the noble metal layer contacts the silicon layer;
- performing a siliconization such that the surface of the noble metal layer contacting the silicon layer is siliconized;
- performing an oxidation to oxidize a silicide layer formed from the silicon layer;
- and
- applying an insulation layer.
A method for fabricating a component, which comprises:
- applying an insulation layer to a substrate, subsequently applying a silicon layer to the substrate, and subsequently applying a noble metal layer to the substrate such that a surface of the noble metal layer contacts the silicon layer;
- performing a siliconization such that the surface of the noble metal layer contacting the silicon layer is siliconized;
- and
- performing an oxidation to oxidize a silicide layer formed from the silicon layer.
A method for fabricating a component, which comprises:
- applying a noble metal layer to a substrate;
- at an elevated temperature, exposing the noble metal layer to an atmosphere including at least one silane so that a silicide layer is formed at a surface of the noble metal layer;
- and
- applying an insulation layer.
A component, comprising:
- a noble metal layer made of a material and having a surface;
- an insulation layer;
- and
- a mixed layer serving as an adhesion promoting layer;
- said surface of said noble metal layer facing said insulation layer;
- said mixed layer formed at said surface of said noble metal layer;
- and
- said mixed layer including silicon, oxygen, and said material of said noble metal layer.
A semiconductor memory, comprising:
- a plurality of storage capacitors each having two electrodes;
- a noble metal layer made of a material and having a surface;
- an insulation layer;
- and
- a mixed layer serving as an adhesion promoting layer;
- said surface of said noble metal layer facing said insulation layer;
- said mixed layer formed at said surface of said noble metal layer;
- said mixed layer including silicon, oxygen, and said material of said noble metal layer;
- at least one of said two electrodes being formed by said noble metal layer.
Dependencies are inferred from the claim text.