Method for forming a non-photosensitive pixel-defining layer on an OLED panel

A method for forming a pixel-defining layer on an OLED panel, comprising following steps:

• (A) providing a substrate;
• (B) forming a plurality of first electrodes in parallel stripes on said substrate;
• (C) coating a layer of non-photosensitive polyimide or polyimide precursor compositions on said substrate with said first electrodes;
• (D) first prebaking said substrate with said layer of said non-photosensitive polyimide or polyimide precursor compositions;
• (E) coating a layer of photoresist compositions on said layer of non-photosensitive polyimide or polyimide precursor compositions;
• (F) second prebaking said substrate with said layer of said photoresist compositions;
• (G) forming patterns of said photoresist by exposing said substrate to masked radiaion and developing said photoresist;
• (H) etching said layer of said non-photosensitive polyimide or polyimide precursor compositions to form a patterned layer of said non-photosensitive polyimide or polyimide precursor compositions;
• (I) releasing or stripping said patterned layer of said photoresist compositions;
• and
• (J) baking said substrate with said patterned non-photosensitive polyimide or polyimide precursor compositions for crosslinking or curing said patterned non-photosensitive polyimide or polyimide precursor compositions to form said pixel-defining layer.