Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same
AssigneeSamsung Electronics Co., Ltd.
InventorsKwang-Sub Yoon, Ki-Yong Song, Sang-Jun Choi, Sang-Gyun Woo
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Abstract
Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer. The photosensitive polymer has an average molecular weight of about 3,000-100,000 with a repeating unit including a group having one of structural formulae below: 1
Claims57
A photosensitive polymer having an average molecular weight of about 3,000-100,000 with a repeating unit including a group of one of the following structural formulae:
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A photosensitive polymer having an average molecular weight of about 3,000-100,000 with a first repeating unit selected from the group of one of the following structural formulae:
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- and at least one second repeating unit [(b)] selected from the group consisting of acrylate, methacrylate, maleic anhydride, norbornene, styrene, tetrafluoroethylene, and sulfur dioxide derivatives.
Dependencies are inferred from the claim text.