Photoresist compositions particularly suitable for short wavelength imaging
AssigneeShipley Company, L.L.C.
InventorsPETER TREFONAS III, GARY N. TAYLOR
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AssigneeShipley Company, L.L.C.
InventorsPETER TREFONAS III, GARY N. TAYLOR
Estimating the term…
The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.
A photoresist composition comprising a resin binder, a photoacid generator compound and a non-aromatic amine compound that has from about 7 to about 20 carbon atoms and contains no primary or secondary amine groups.
A positive-acting photoresist composition comprising 1) a resin binder that comprises a polymer that contains pendant photoacid labile moieties and is substantially free of any aromatic groups, 2) a non-ionic photoacid generator compound, and 3) a non-aromatic amine compound that has from 9 to 16 carbon atoms and contains no primary or secondary amine groups, and wherein the amine does not contain two tertiary amine groups linked by an optionally substituted ethylene group.
A photoresist composition comprising a resin binder, a photoacid generator compound and a non-aromatic amine compound that comprises either 1) a tertiary nitrogen alicyclic ring member;
Dependencies are inferred from the claim text.