US 2003/0157423 A1 · Copolymer, polymer mixture, and radiation-sensitive resin composition

Abstract

1. A copolymer having recurring units of the following formulas (1), (2), and (3), 1 wherein R1, R4, R5, and R6 are a hydrogen atom or a methyl group, R2, R3, and R7 represent a monovalent organic group, k is 1 or 2, 1 is 0-4, n is 1-3, m is 0-3, R8, is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being the same or different, q is 1-3, and p is 0-3, the copolymer having a GPC average molecular weight of 3,000-100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.

Claims17

Dependent claims

A copolymer having recurring units of the following formulas (1), (2), and (3),

10
wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a monovalent organic group, k is an integer of 1 or 2, and 1 is an integer of O to 4,
11
wherein R4 represents a hydrogen atom or a methyl group, R5 represents a monovalent organic group, n is an integer of 1 to 3, and m is an integer of 0 to 3, and
12
wherein R6 represents a hydrogen atom or a methyl group, R7 represents a monovalent organic group, R8 indicates a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being either the same or different, q is an integer of 1 to 3, and p is an integer of 0 to 3, the copolymer having a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3,000-100,000.

3 more elements

A radiation-sensitive resin composition comprising:

(A) a polymer component containing recurring units of the following formulas (1), (2), and (3),
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wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a monovalent organic group, k is an integer of 1 or 2, and 1 is an integer of 0 to 4,
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wherein R4 represents a hydrogen atom or a methyl group, R5 represents a monovalent organic group, n is an integer of 1 to 3, and m is an integer of 0 to 3, and
18
wherein R6 represents a hydrogen atom or a methyl group, R7 represents a monovalent organic group, R8 indicates a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being either the same or different, q is an integer of 1 to 3, and p is an integer of 0 to 3, and
(B) a photoacid generator.

5 more elements

Dependencies are inferred from the claim text.

Copolymer, polymer mixture, and radiation-sensitive resin composition

Life of this patent

Copolymer, polymer mixture, and radiation-sensitive resin composition

Life of this patent

Abstract

Claims17