Micro devices manufacturing method utilizing concave and convex alignment mark patterns
AssigneeNikon Corporation
InventorsShinji Mizutani, Kazuya Ota, Masahiko Yasuda
Life of this patent
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Abstract
An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.
Claims23
An exposure method including:
- a first step of forming on a substrate an alignment mark including a concave and convex pattern, said mark being formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value;
- a second step of forming a coat over said alignment mark and the other area on said substrate;
- a third step of flattening said coat;
- and
- a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto.
A mask formed with an original pattern of alignment mark together with a pattern to be transferred, wherein the original pattern of said alignment mark is formed by disposing, between adjacent blight portions hating a width of not less than a predetermined value, one or more blight patterns having a width of less than said predetermined value with a pitch less than said predetermined value.
A mask formed with an original pattern of alignment mark together with a pattern to be transferred, wherein the original pattern of said alignment mark is formed by disposing, between adjacent dark portions having a width of not less than a predetermined value, one or more dark patterns having a width of less than said predetermined value with a pitch of less than said predetermined value.
An exposure method including steps of:
- forming a plurality of first patterns having a height with a predetermined interval on a predetermined surface of a substrate as an alignment mark;
- and
- forming a plurality of second patterns having a height with an interval of less than said predetermined interval between adjacent first patterns.
A mask including:
- a plurality of first shading patterns arranged with a predetermined interval so as to form an alignment mark on the substrate;
- and
- a plurality of second shading patterns disposed between said first shading pattern with an interval which is less than said predetermined interval.
A mask including:
- a plurality of light transmittivity areas which are spaced each other with a predetermined distance so as to form an alignment mark on the substrate;
- and
- a plurality of shading patterns, each of which is disposed between said light transmittivity areas with a distance of less than said predetermined distance.
An exposure method including a step of forming, between a plurality of first patterns which constitute an alignment mark on a predetermined surface on a substrate and has a height, second patterns so as to reduce depression in a film covering the alignment mark.
A substrate polishing apparatus including:
- a first holding member for holding a polishing member adapted to polish the surface of a film formed on the substrate;
- a second holding member for holding the substrate such that the film surface on the substrate faces the polishing member;
- a rotary member for relatively rotating said first holding member and said second holding member with respect to each other;
- and
- a change-over system for changing the direction of relative rotation between said first holding member and said second holding member.
Dependencies are inferred from the claim text.