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OwnerNasser Beldi, Eric Adriansensinventors
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The invention concerns in particular a method using a low pressure plasma for depositing a barrier coating on a substrate to be treated, wherein the plasma is obtained by partial ionisation, under the action of an electromagnetic field, of a reaction fluid injected under low pressure in a treating zone. The method is characterised in that it comprises at least a step which consists in depositing on the substrate an interface layer which is obtained by bringing to plasma state a mixture comprising at least an organosilicon compound and a nitrogenous compound, and a step which consists in depositing, on the interface layer, a barrier layer, essentially consisting of a silicon oxide of formula SiOx.
Method using a low pressure plasma to deposit a barrier coating on a substrate to be treated, of the type in which the plasma is obtained by partial ionization, under the action of an electromagnetic field, of a reactive fluid injected under low pressure into the treatment area,
Method according to any of the preceding claims, characterized in that the thickness of the interface layer is between 2 and 10 nanometers.
Method according to any of the preceding claims, characterized in that the barrier layer is obtained by low-pressure plasma deposition of an organosilicon compound in the presence of an excess of oxygen.
Method according to any of the preceding claims, characterized in that the organosilicon compound is an organosiloxane.
Method according to any of the preceding claims, characterized in that the barrier layer has a thickness of between 8 and 20 nanometers.
Method according to any of the preceding claims, characterized in that the steps are continuously linked so that, in the processing area, the reactive fluid remains in the plasma state during the transition between the two steps.
Method according to any of the preceding claims, characterized in that the method includes a third step during which the barrier layer is covered with a protective layer of hydrogenated amorphous carbon.
Method according to any of the preceding claims, characterized in that the substrate is composed of a polymer material.
Barrier coating deposited on a substrate by low pressure plasma, characterized in that it comprises a barrier layer, composed essentially of a silicon oxide with the formula SiOx, and in that, between the substrate and the barrier layer, the coating includes an interface layer that is composed essentially of silicon, carbon, oxygen, nitrogen, and hydrogen.
Dependencies are inferred from the claim text.