Long persistent phosphor incorporated within a non-settable material
OwnerBradford K. Mortz, Robert H. Millerinventors
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Abstract
A process for incorporating a long persistent phosphor within a non-settable material includes firing a doped phosphor to obtain a phosphor having a persistence that ranges from minutes to hours. The fired phosphor is then ground into a phosphor particulate having a mean domain size. Typical particulate mean domain size ranges from 1 to 60 microns. The phosphor particulate is thereafter encapsulated within a water impervious coating material such as silicon oxide or fluoride. The coated phosphor particulate is then mixed in a specified volume ratio within the non-settable material. Typical formulation ratios range from 0.1 to 30 volume percent of particulate.
Claims14
A process for incorporating a long persistent phosphor within a non-settable material, comprising the steps of:
- firing a doped phosphor;
- grinding said doped phosphor into a phosphor particulate having a mean domain size;
- encapsulating said phosphor particulate within a water impervious coating material;
- and
- mixing a specified volume ratio of said encapsulated phosphor particulates within the non-settable material.
A phosphorescent non-settable formulation comprising:
- 0.1 to 30 volume percent of a long persistent doped sulfide phosphor particulate having a mean particle domain size of between 1 and 60 microns, said particulate having a water impervious coating thereover selected from the group consisting of:
- silicon oxide and fluoride;
- and
- a non-settable material carrier for said particulate.
The formulation according to claim 8 wherein said particulate is present from 5 to 20 volume percent.
The formulation according to claim 11 further comprising a second lanthanide dopant.
Dependencies are inferred from the claim text.