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AssigneeSingulus Mastering B.V.
InventorsPieter Willem Herman De Jager, Gerardus Johannes Verhaart, Quirinus Antonius Gerardus Van Vlimmeren
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A device for electron-beam lithography wherein very small pits can be written, using a small beam intensity, by exposing each pit several times during writing. A row of electron beams is arranged in the longitudinal direction of the track. Each beam from the row of beams can be controlled, either to be projected onto the track via electron optics, or to be scattered to an electron absorbing position. The control of the row of beams ensures that each time a track position to be exposed passes the projection position of a beam from said row of beams, the beam in question is projected onto the position in question. Furthermore means are provided for shifting the beams from the row of beams in transverse direction on the track for the purpose of writing a second track simultaneously with the main track. Finally, several rows of beams arranged one beside another for simultaneously writing onto two tracks arranged one beside another are described.
A device for electron-beam lithography for manufacturing a master disk, comprising means for moving the master disk, means for generating a row of electron beams and means for directing electrons from said row of beams onto a track on the master disk, characterized in that the row of beams extends substantially parallel to the track, in that an aperture element comprising at least one aperture is provided, in that first lens means are disposed between the means for generating said row of beams and the aperture element for the purpose of deflecting electrons in said row of beams in the direction of said at least one aperture, and in that second lens means are disposed between the aperture element and the master disk for the purpose of deflecting electrons that have passed through said at least one aperture in an intended direction onto the master disk, and in that controllable means for deflecting electrons in said row of beams to a position substantially beside the aperture are disposed between the means for generating said row of beams and said aperture element.
Method for the electron-beam lithography manufacture of a master disk, wherein a row of electron beams is generated and directed at a track on the master disk, characterized in that said row of beams is applied in a direction substantially parallel to the track on the master disk, in that said row of beams is deflected through an aperture in an aperture element by a first lens element and projected onto the master disk by a second lens element, and in that said beams are controlled either to be directed at the aperture or not to be directed at the aperture.
Dependencies are inferred from the claim text.