Loading patent…
AssigneeEbara Corporation
InventorsMamoru Nakasuji, Takao Kato, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji
Estimating the term…
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
An electron beam system which comprises a primary optical system for irradiating an electron beam emitted from an electron gun onto a sample and detects secondary electrons emanated from a surface of the sample, said electron beam system characterized in that
An electron beam system in which a primary electron beam emitted from an electron gun is irradiated onto a sample surface and then a secondary electron beam emanated from said sample is detected, said system characterized in further comprising an objective lens for focussing said primary electron beam as well as accelerating said secondary electron beam, wherein said objective lens has a plurality of electrodes.
An electron beam system comprising:
Dependencies are inferred from the claim text.