RTA chamber with in situ reflective index monitor

A rapid thermal anneal system with reflective index monitor, comprising:

• a chamber wall defining a chamber interior;
• a reflector plate provided in said chamber interior;
• a plurality of lamps provided in said chamber interior above said reflector plate;
• at least one monitor opening provided in said chamber wall;
• a reflective index monitor provided in said at least one monitor opening, respectively, for monitoring a reflective index of said reflector plate;
• an alarm operably connected to said reflective index monitor;
• and
• wherein said reflective index monitor sends a signal to said alarm when said reflective index of said reflector plate deviates from a reflective index of a control value.

A method for detecting contamination on a reflector plate situated in a rapid thermal anneal chamber, comprising the steps of:

• providing a rapid thermal anneal chamber comprising a chamber wall and a reflector plate in said chamber wall;
• providing at least one monitor opening in said chamber wall;
• providing a reflective index monitor in said at least one monitor opening, respectively, for measuring a reflective index of said reflector plate;
• and
• sending a signal to a process controller when said reflective index deviates from a reflective index of a control value.