Circuit member processor
OwnerMasao Watanabeinventor
Life of this patent
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Abstract
A multi-layer substrate 2 is reacted with supercritical water in a reaction chamber 14 whose cross section is in the form of an elongated hollow ellipse, and the reaction chamber 14 has a central part having a small curvature, exhibiting substantially a straight line, and end parts having a large curvature, so that the central part of the reaction chamber 14 is suitable for introducing flat materials such as multi-layer substrates 2 thereinto. Furthermore, the large curvature of the reaction chamber 14 at the ends thereof provides a wider inner surface, thereby enabling the reaction chamber 14 to be proof against a high pressure.
Claims9
A circuit component processing apparatus wherein circuit components are reacted with supercritical water, said apparatus comprising:
- a reaction means in which said circuit components are reacted with said supercritical water,
- wherein said reaction means is equipped with an elongated ellipse cylinder shaped reaction chamber having a hollow ellipse cross section, said reaction chamber having a small curvature at the center part, thereby exhibiting substantially straight line, and a large curvature at its ends.
A circuit component processing apparatus wherein circuit components are reacted with supercritical water, said apparatus comprising:
- a reaction means in which said circuit components are reacted with said supercritical water,
- wherein said reaction means is inclined.
Dependencies are inferred from the claim text.