Acetal compound, polymer, resist composition and patterning response
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
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Abstract
Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
Claims7
A polymer comprising recurring units of the following general formula (4-1) or (4-2) and having a weight average molecular weight of 1,000 to 500,000,
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- wherein R is hydrogen or a straight, branched or cyclic alkyl group of 1 to 6 carbon atoms,
- W is a single bond or
- —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group,
- m is an integer from 1 to 8, k is 0 or 1, and n is 2 or 3.
Dependencies are inferred from the claim text.