Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server

A manufacturing method for exposure mask comprising:

• acquiring information showing a surface shape of surface of each of a plurality of mask substrates;
• forming a corresponding relation between each of the mask substrates and the information;
• selecting the information showing a convex surface shape from the corresponding relation of the mask substrates, and selecting the mask substrate in the corresponding relation with the selected information from the plurality of mask substrates;
• and
• forming a desired pattern on the selected mask substrate.

A mask substrate comprising:

• a substrate having a surface;
• and
• a light shielding material layer configured to cover the surface of the substrate,
• wherein a surface shape of a peripheral region of the surface of the substrate is lower in height than the surface of the central portion of the surface of the substrate toward a peripheral edge of the substrate.

An exposure mask comprising:

• a substrate having a surface;
• and
• a light shielding material pattern formed on the surface of the substrate,
• wherein a surface shape of a peripheral region is lower in height than a surface of a central region of the surface of the substrate toward a peripheral edge of the substrate.

A server comprising:

• a processing device which processes storing a page including information showing a corresponding relation between a first information showing a surface shape of a surface of each of a plurality of mask substrates and the second information showing a flatness of the surface of each mask substrate before and after chucked on a mask stage of an exposure apparatus;
• a processing device which processes accepting a request message corresponding to the page from a client;
• a processing device which processes transmitting the page in a format displayable at the client side;
• and
• a processing device which processes accepting an application message of the mask substrate from the client having the page transmitted.

A manufacturing method for exposure mask comprising:

• acquiring a first information showing a surface shape of a surface of each of a plurality of mask substrates, and a second information showing flatness of the surface of each of mask substrates after chucked on a mask stage of an exposure apparatus obtained by simulation on the basis of flatness of the surface of each of the mask substrates measured by a flatness measuring apparatus and a structure of a mask chuck of the exposure apparatus;
• forming a corresponding relation of each mask substrate, the first information and the second information;
• selecting the second information showing a desired flatness among the second information of the corresponding relation, and preparing another mask substrate having the same surface shape as the surface shape indicated by the first information in the corresponding relation with the selected second information;
• and
• forming a desired pattern on said another mask substrate.

A manufacturing method for exposure mask comprising:

• acquiring a first information showing a mask substrate and a surface shape of a surface of the mask substrate;
• acquiring a second information showing flatness of the surface of the mask substrate after chucked on a mask stage of an exposure apparatus obtained by simulation on the basis of the surface shape of the surface of the mask substrate shown by the first information and a structure of a mask chuck of the exposure apparatus;
• judging whether or not the flatness of the surface of the mask substrate is conformed to a specification;
• and
• processing the mask substrate to form an exposure mask if it is judged that the flatness is conformed.