Novel method for forming polymer pattern
OwnerMasao Washizu, Osamu Kurosawainventors
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Abstract
A method for forming a combinatorial polymer pattern, which comprises immersing a particulate carrier in monomer addition reactors successively in accordance with a predetermined order using a particle transporting means, to thereby prepare a particle having a polymer having a predetermined sequence bonded thereto, and arranging such particles systematically. The method is practiced by using a plurality of reactors, each of which is provided for a specific monomer, a device for controlling the transfer of particles between the reactors, and a device for arranging particles on a substrate.
Claims9
A method for forming a combinatorial polymer pattern whereby different polymers synthesized with a plurality of monomer types in various sequences are immobilized on a wafer in a specific pattern, the method comprising the steps of:
- (1) preparing a plurality of reactors each containing a different monomer, a particle transfer control device for controlling transfer of particles between the reactors and a device for arranging the particles on a wafer,
- (2) controlling the transport of the particles as carriers by said particle transfer control device for their immersion in the reactors according to a predetermined order, to synthesize polymers having predetermined sequences on the carrier particle surfaces, and
- (3) arranging the particles obtained in step (2) on a wafer to form a pattern of polymers having various sequences on said wafer.
Dependencies are inferred from the claim text.