Nano-lithography using squeezed atomic and molecular states
AssigneeYeda Research and Development Co. Ltd.
InventorEliyahu Averbukh
Life of this patent
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Abstract
A method and apparatus for performing atomic and molecular nano-deposition by means of atomic or molecular focusing through a plurality of optical standing waves. A stacked set of standing light waves, preferably arranged as gratings in a predetermined form and of predetermined intensities, is used to sequentially compress or squeeze the width of the incident atomic or molecular beam into ultra-narrow, spatially localized spots or lines. The result is a focused beam of particles with improved resolution compared with prior art atomic focusing. Furthermore, spherical and chromatic aberrational effects can be reduced.
Claims42
A method for focusing a beam comprising atomic species, comprising the steps of:
- forming a collimated beam of said atomic species;
- providing a first plurality of electromagnetic standing waves of essentially identical spatial period and having their planes parallel to each other, arranged serially across the path of said beam at predetermined distances from each other, said standing waves being aligned laterally such that their nodes are collinear;
- and
- directing said collimated beam through said standing waves.
A system for performing deposition of atomic species comprising:
- a source omitting a collimated beam of said atomic species;
- a first plurality of electromagnetic standing waves of essentially identical spatial period and having their planes parallel to each other, arranged serially across the path of said beam at predetermined distances from each other, said standing waves being aligned laterally such that their nodes are collinear;
- and
- a substrate disposed at a predetermined location after the last one of said plurality of standing waves, such that said atomic species of said beam are deposited onto said substrate.
Dependencies are inferred from the claim text.