Method of forming a silica layer for optical waveguide

Abstract

Disclosed is a method of forming a silica layer for an optical waveguide. The present invention includes the steps of preparing a chamber having a magnetic coil, a gas supply unit, and a support and injecting a reactant gas in the chamber to deposit the silica layer on a substrate mounted on the support by high density plasma chemical vapor deposition. The present invention provides the high deposition ratio of the silica layer since the ionization of the reactant gas proceeds fast due to the high density plasma induced by the magnetic coil. Moreover, the sputtering process by the inert gas and the silica layer depositing process are simultaneously carried out to provide the silica layer with a high deposition ratio and high density, whereby additional annealing is unnecessary as well as the process can be carried out at a low temperature to fabricate various silica-polymer mixed waveguide.

Dependencies are inferred from the claim text.