Exposure apparatus and method, and device fabricating method using the same
AssigneeCanon Kabushiki Kaisha
InventorKenichiro Shinoda
Life of this patent
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Abstract
An exposure apparatus includes a projection optical system for exposing and transferring a pattern on a mask onto an object, an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in the projection optical system, and for illuminating the mask, and a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source to the object and a light intensity distribution on the secondary light source surface.
Claims26
An exposure apparatus comprising:
- a projection optical system for exposing and transferring a pattern on a mask onto an object;
- an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in said projection optical system, and for illuminating the mask;
- and
- a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source surface to the object and a light intensity distribution on the secondary light source surface.
An exposure apparatus comprising:
- a projection optical system for exposing and transferring a pattern on a mask onto an object;
- an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in said projection optical system, and for illuminating the mask;
- and
- a secondary light-source adjusting mechanism for adjusting a light intensity distribution on the secondary light source surface according to transmittance distributions from the secondary light source surface to the object.
An exposure apparatus comprising:
- a projection optical system for exposing and transferring a pattern on a mask onto an object;
- an illumination optical system for forming a secondary light source approximately conjugate with a pupil in said projection optical system, and for illuminating the mask;
- and
- a convex meniscus lens provided at the object or at a position approximately conjugate with the object according to transmittance distributions from the secondary light source surface to the object.
An exposure method for projecting and exposing a pattern on a mask onto an object using an exposure apparatus, said exposure method comprising the steps of:
- detecting a change of an angular distribution of exposure light incident on the object;
- and
- correcting the angular distribution based on a detection result,
- wherein said exposure apparatus includes:
- a projection optical system for exposing and transferring a pattern on the mask onto the object;
- an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in said projection optical system, and for illuminating the mask;
- and
- a secondary light-source adjusting mechanism for adjusting a light intensity distribution on the secondary light source surface according to transmittance distributions from the secondary light source surface to the object.
A device fabricating method comprising the steps of:
- projecting and exposing a pattern on a mask onto an object using an exposure apparatus;
- and
- developing the exposed object,
- wherein said exposure apparatus includes:
- a projection optical system for exposing and transferring a pattern on a mask onto an object;
- an illumination optical system for forming a secondary light source approximately conjugate with a pupil in said projection optical system, and for illuminating the mask;
- and
- a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source surface to the object and a light intensity distribution on the secondary light source surface.
Dependencies are inferred from the claim text.