Projection exposure apparatus

A projection exposure apparatus comprising:

• an illumination optical system that illuminates a mask having a transfer pattern formed thereon by illuminating light from a light source;
• a projection optical system that projects an image of the pattern on said mask onto a photosensitive substrate under said illuminating light;
• a substrate stage that moves said photosensitive substrate;
• a plurality of casings that accommodate said illumination optical system, said projection optical system, and said substrate stage independently of each other;
• and
• a gas supply device that selectively supplies a plurality of different kinds of gas into at least one of said casings.

A projection exposure apparatus comprising:

• an illumination optical system that illuminates a mask having a transfer pattern formed thereon by illuminating light from a light source;
• a projection optical system that projects an image of the pattern on said mask onto a photosensitive substrate under said illuminating light;
• a casing having light-transmitting windows disposed in an optical path of said illuminating light between said light source and said photosensitive substrate;
• and
• a gas controller that supplies into said casing. a gas in which an amount of ozone per unit volume is variable;
• wherein an illuminance of illuminating light emitted from said light source and applied to said photosensitive substrate is controlled by changing the amount of ozone in the gas supplied into said casing from said gas controller.

A projection exposure apparatus comprising:

• a light source;
• a mask having a transfer pattern;
• a projection optical system that projects an image of a part of said transfer pattern onto a photosensitive substrate by light from said light source;
• a device having a mask-side stage that scans said mask relative to said projection optical system, and a substrate-side stage that scans said photosensitive substrate relative to said projection optical system in synchronism with said mask-side stage, so that the transfer pattern on said mask is transferred onto said photosensitive substrate by synchronously scanning said mask and said photosensitive substrate relative to said projection optical system;
• an antivibration plate to which a movable part that moves synchronously with scanning exposure is secured;
• and
• another antivibration plate to which a stationary part that is not synchronous with scanning exposure is secured.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member driving a predetermined member in said second optical members to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member driving a predetermined optical member in said second optical members to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member driving a predetermined optical member in said second optical members to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member driving a predetermined optical member in said second optical members to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a pressure of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a pressure of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a pressure of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a pressure of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a temperature of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a temperature of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a temperature of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a temperature of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a humidity of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members having aspherized surfaces, and second optical members having planarized surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a humidity of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising:

• a projection optical system that projects an image of a pattern formed on a mask onto a substrate, and
• an image-forming characteristic correcting member,
• said projection optical system including first optical members made of fluorite, and second optical members having spherical surfaces, at least a part of said first optical members being placed in an atmosphere of a first gas that is not readily affected by variations in atmospheric conditions, and at least a part of said second optical members being placed in an atmosphere of a second gas different from said first gas,
• said image-forming characteristic correcting member controlling a humidity of a part of said second gas to correct image-forming characteristics of said projection optical system.

A projection exposure apparatus comprising a projection optical system that projects an image of a pattern formed on a mask onto a substrate,

• said projection optical system comprising:
• first optical members having aspherized surfaces,
• second optical members having spherical surfaces,
• a first lens barrel that accommodates at least a part of said first optical members, and
• a second lens barrel that accommodates optical members other than the optical members accommodated in said first lens barrel, said second lens barrel being separable from said first lens barrel,
• said first lens barrel being a double structure having an optical member retaining frame that retains optical members accommodated therein, and an outer casing that retains said optical member retaining frame with a predetermined gap therebetween,
• said gap in said first lens barrel being supplied with a first gas that is not readily affected by variations in atmospheric conditions, and
• at least a part of said second lens barrel being supplied with a second gas different from said first gas.

A projection exposure apparatus comprising a projection optical system that projects an image of a pattern formed on a mask onto a substrate,

• said projection optical system comprising:
• first optical members made of fluorite,
• second optical members having spherical surfaces,
• a first lens barrel that accommodates at least a part of said first optical members, and
• a second lens barrel that accommodates optical members other than the optical members accommodated in said first lens barrel, said second lens barrel being separable from said first lens barrel,
• said first lens barrel being a double structure having an optical member retaining frame that retains optical members accommodated therein, and an outer casing that retains said optical member retaining frame with a predetermined gap therebetween,
• said gap in said first lens barrel being supplied with a first gas that is not readily affected by variations in atmospheric conditions, and
• at least a part of said second lens barrel being supplied with a second gas different from said first gas.

A projection exposure apparatus comprising a projection optical system that projects an image of a pattern formed on a mask onto a substrate,

• said projection optical system comprising:
• first optical members having aspherized surfaces,
• second optical members having planarized surfaces,
• a first lens barrel that accommodates at least a part of said first optical members, and
• a second lens barrel that accommodates optical members other than the optical members accommodated in said first lens barrel, said second lens barrel being separable from said first lens barrel,
• said first lens barrel being a double structure having an optical member retaining frame that retains optical members accommodated therein, and an outer casing that retains said optical member retaining frame with a predetermined gap therebetween,
• said gap in said first lens barrel being supplied with a first gas that is not readily affected by variations in atmospheric conditions, and
• at least a part of said second lens barrel being supplied with a second gas different from said first gas.

A projection exposure apparatus comprising a projection optical system that projects an image of a pattern formed on a mask onto a substrate,

• said projection optical system comprising:
• first optical members made of fluorite;
• second optical members having planarized surfaces,
• a first lens barrel that accommodates at least a part of said first optical members, and
• a second lens barrel that accommodates optical members other than the optical members accommodated in said first lens barrel, said second lens barrel being separable from said first lens barrel,
• said first lens barrel being a double structure having an optical member retaining frame that retains optical members accommodated therein, and an outer casing that retains said optical member retaining frame with a predetermined gap therebetween,
• said gap in said first lens barrel being supplied with a first gas that is not readily affected by variations in atmospheric conditions, and
• at least a part of said second lens barrel being supplied with a second gas different from said first gas.

A projection exposure apparatus comprising a projection optical system that projects an image of a pattern formed on a mask onto a substrate,

• said projection optical system comprising:
• a flange member integrated with a lens barrel of said projection optical system,
• a plurality of position adjusting members mounted on said flange member, a position of each of said position adjusting members being adjustable in a direction of an optical axis of said projection optical system, and
• a plurality of pressure sensors incorporated in correspondence with said position adjusting members,
• said position adjusting members being subjected to position adjustment such that pressures detected with said pressure sensors are equal to corresponding pressures detected during adjustment of said projection optical system as a single element.