Glass plate provided with electrodes made of a conducting material
AssigneeSyngenta Participations AG
InventorsAgide Moi, Luc Berthier, Jean-Pierre Creusot
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Abstract
The present invention relates to a plate, more particularly for plasma display panels, comprising a substrate 10 on which at least one electrode 21, made of a conducting material consisting of an aluminium-based and/or zinc-based metal alloy having a melting point above 700° C., is produced; the electrode is intended to be covered with a dielectric layer. Thus, the deleterious effects arising from the reactions of the electrode material with the materials of the dielectric layer, especially during baking of this layer, are reduced.
Claims10
1- Plate comprising a glass substrate supporting an array of conducting electrodes covered with a dielectric layer, characterized in that, at least at the interface between the said electrodes and the glass and/or at least at the interface between the said electrodes and the dielectric layer, the conducting material of the electrodes consists of an aluminium-based and/or zinc-based metal alloy having a melting point above 700° C.
2- Plate according to claim 1, characterized in that the said alloy comprises, apart from the said base metal, at least 0.01% by weight of at least one dopant whose nature and proportions in the alloy are tailored so that the said alloy has a melting point above 700° C.
- Plate according to claim 2, characterized in that the nature of the at least one dopant is tailored so that the corresponding alloy does not have an eutectic.
- Plate according to either one of claims 2 and 3, characterized in that the at least one dopant is chosen from the group comprising titanium, zirconium, vanadium, chromium, molybdenum, tungsten, manganese, iron and antimony.
- Plate according to claim 4, characterized in that, when the base metal is aluminium, the at least one dopant is chosen from the group comprising vanadium, titanium and manganese.
- Plate according to claim 5, characterized in that the proportions by weight of the at least one dopant in the said alloy are around 2%.
7- Plate according to any one of claims 1 to 7, characterized in that the electrodes consist of at least one thin layer of the said alloy.
8- Plate according to claim 7, characterized in that the electrodes consist of a stack of thin layers, comprising:
- at least one thin layer consisting of the said alloy in contact with the glass of the substrate and/or in contact with the dielectric layer;
- and
- a thin layer consisting of the said base metal.
9- Plate according to any one of the preceding claims 1 to 8, characterized in that the dielectric layer consists of a glass or an enamel based on lead oxide, silicon oxide and boron oxide, based on bismuth oxide, silicon oxide and boron oxide, containing no lead, or based on bismuth oxide, lead oxide, silicon oxide and boron oxide in the form of a mixture.
10- Plate according to any one of claims 1 to 9, characterized in that it is used in the manufacture of display panels such as plasma display panels.