Apparatus and method to control the uniformity of plasma by reducing radial loss

Abstract

A capacitively coupled plasma reactor composed of: a reactor chamber enclosing a plasma region; upper and lower main plasma generating electrodes for generating a processing plasma in a central portion of the plasma region by transmitting electrical power from a power source to the central portion while a gas is present in the plasma region; and a magnetic mirror including at least one set of magnets for maintaining a boundary layer plasma in a boundary portion of the plasma region around the processing plasma. A capacitively coupled plasma reactor composed of: a reactor chamber enclosing a plasma region; upper and lower plasma generating electrodes for generating a processing plasma in the plasma region by transmitting electrical power from a power source to the plasma region while a gas is present in the plasma region; and power supplies for applying a VHF drive voltage to the upper plasma generating electrode and RF bias voltages at a lower frequency than the VHF drive voltage to the upper and lower plasma generating electrodes.

Dependencies are inferred from the claim text.