Silicon monoxide vapor deposition material, process for producing the same, raw material for producing the same, and production apparatus

A silicon monoxide vapor deposition material, having a total amount of metallic impurities of 50 ppm or less.

A silicon monoxide vapor deposition material, having an average bulk density of 2.0 g/cm3, a Vickers hardness of 500 or more, and a total content of metallic impurities of 50 ppm or less.

A process for producing a silicon monoxide vapor deposition material, comprising a degassing treatment step of holding a mixed granulated body of metallic silicon powder and silicon dioxide powder or a solid silicon monoxide raw material for 0.5 to 4.0 hours at 800 to 1200° C. in a vacuum atmosphere, followed by a sublimation step of raising the temperature of the raw material to generate gaseous silicon monoxide.

A process for producing a silicon monoxide vapor deposition material, comprising a sublimation step of raising the temperature of a mixed granulated body of metallic silicon powder and silicon dioxide powder or a solid silicon monoxide raw material to generate gaseous silicon monoxide, followed by a step of passing the sublimated gas into and through a perforated passage to remove unreacted fine powder.

A process for producing a silicon monoxide vapor deposition material, comprising a degassing treatment step of holding a mixed granulated body of metallic silicon powder and silicon dioxide powder or a solid silicon monoxide raw material for 0.5 to 4.0 hours at 800 to 1200° C. in a vacuum atmosphere, followed by a sublimation step of raising the temperature of the raw material to generate gaseous silicon monoxide, and a step of passing the sublimated gas into and through a perforated passage to remove unreacted fine powder.

A process for producing a silicon monoxide vapor deposition material, comprising a step of forming metallic silicon powder and silicon dioxide powder having an average particle size in a range of 1 μm to 40 μm into a mixed granulated body.

A process for producing a silicon monoxide vapor deposition material, comprising a step of forming metallic silicon powder and silicon dioxide powder into a mixed granulated body with a mixing ratio in a range of 0.90 to 0.99 as a molar ratio (silicon dioxide/metallic silicon).

A process for producing a silicon monoxide vapor deposition material, comprising a step of forming metallic silicon powder and silicon dioxide powder having an average particle size in a range of 1 m to 40 m into a mixed granulated body with a mixing ratio in a range of 0.90 to 0.99 as a molar ratio (silicon dioxide/metallic silicon).

A raw material for producing a silicon monoxide vapor deposition material, comprising a mixed granulated body of metallic silicon powder and silicon dioxide powder having an average particle size in a range of 1 μm to 40 μm.

A raw material for producing a silicon monoxide vapor deposition material, comprising a mixed granulated body of metallic silicon powder and silicon dioxide powder with a mixing ratio in a range of 0.90 to 0.99 as a molar ratio (silicon dioxide/metallic silicon).

A raw material for producing a silicon monoxide vapor deposition material, comprising a mixed granulated body of metallic silicon powder and silicon dioxide powder having an average particle size in a range of 1 m to 40 m with a mixing ratio in a range of 0.90 to 0.99 as a molar ratio (silicon dioxide/metallic silicon).

An apparatus for producing a silicon monoxide vapor deposition material, in which, in a vacuum deposition apparatus, perforated passage means for passing a sublimated gas into and through a perforated passage to remove unreacted fine powder is disposed between a raw material chamber in which a sublimation step is carried out on a raw material for producing the silicon monoxide vapor deposition material and a deposition chamber in which a vapor deposition step is carried out.