US 2003/0149213 A1 · Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane

Abstract

The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a neutral to weakly acidic polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a neutral to weakly acidic polymerization inhibitor. A free radical scavenger can also be included in the process and composition.

Claims30

Dependent claims

A process for stabilizing a cyclotetrasiloxane against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication, comprising;

providing an effective amount of a neutral to weakly acidic polymerization inhibitor to said cyclotetrasiloxane having the following formula:
4
where R1-7 are individually selected from the group consisting of hydrogen, a normal, branched or cyclic C1-10;
alkyl group, and a C1-4 alkoxy group.

1 more element

A composition of 1,3,5,7-tetramethylcyclotetrasiloxane, used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, stabilized against polymerization, comprising (a) 1,3,5,7-tetramethylcyclotetrasiloxane, (b) a neutral to weakly acidic polymerization inhibitor selected from the group consisting of 2,4-pentanedione;

1-hexanoic acid;
glycerol;
acetic anhydride;
less than 1% (vol.) 1,1,1,5,5,5-hexamethyltrisiloxane;
less than 1% (vol.) 1,1,1,3,5,5,5-heptamethyltrisiloxane;
β-diketones RC(O)CH2C(O)R;
aliphatic carboxylic acids RCOOH;
aliphatic dicarboxylic acids HOOC—(CH2)n—COOH in which 1≦n≦8;
phenols C6R(6-n)(OH)n in which 1≦n≦5;
polyols CH2X(CHX)nCH2X, in which X=H or OH but at least one X=OH and 1≦n≦8;
anhydrides RCH2—C(O)—O—C(O)—CH2R;
hydrodosiloxanes R3Si—(O—SiR2)n—OSiR3, in which 0≦n≦8, all wherein R is individually selected from the group consisting of hydrogen, normal, branched or cyclic C1-10 alkyl groups;
and mixtures thereof, and (c) a free radical scavenger selected from the group consisting of 2,6-di-tert-butyl-4-methyl phenol, 2,2,6,6-tetramethyl-1-piperidinyloxy, 2-tert-butyl-4-hydroxyanisole, 3-tert-butyl-4-hydroxyanisole, propyl ester 3,4,5-trihydroxy-benzoic acid, 2-(1,1-dimethylethyl)-1,4-benzenediol, diphenylpicrylhydrazyl, 4-tert-butylcatechol, N-methylaniline, p-methoxydiphenylamine, diphenylamine, N,N′-diphenyl-p-phenylenediamine, p-hydroxydiphenylamine, phenol, octadecyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate, tetrakis (methylene (3,5-di-tert-butyl)-4-hydroxy-hydrocinnamate) methane, phenothiazines, alkylamidonoisoureas, thiodiethylene bis (3,5,-di-tert-butyl-4-hydroxy-hydrocinnamate, 1,2,-bis (3,5-di-tert-butyl-4-hydroxyhydrocinnamoyl) hydrazine, tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, cyclic neopentanetetrayl bis (octadecyl phosphite), 4,4′-thiobis (6-tert-butyl-m-cresol), 2,2′-methylenebis (6-tert-butyl-p-cresol), oxalyl bis (benzylidenehydrazide) and mixtures thereof.

10 more elements

Dependencies are inferred from the claim text.

Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane

Life of this patent

Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane

Life of this patent

Abstract

Claims30