Dressing apparatus and polishing apparatus
AssigneeEbara Corporation
InventorsTetsuji Togawa, Ikutaro Noji, Shunichiro Kojima, Nobuyuki Takada
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Abstract
A dressing apparatus dresses a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer in a polishing apparatus. The dressing apparatus comprises a dresser body (31) connected to a dresser drive shaft (23) which is vertically movable, a dresser plate (32) which is vertically movable with respect to the dresser body (31), and a dressing member (22) held by the dresser plate (32) for dressing the polishing surface (1a).
Claims11
A dressing apparatus for dressing a polishing surface of a polishing table for polishing a surface of a workpiece, the dressing apparatus comprising:
- a dresser body connected to a dresser drive shaft which is vertically movable;
- a dresser plate which is vertically movable with respect to said dresser body;
- and
- a dressing member held by said dresser plate for dressing said polishing surface.
Dependencies are inferred from the claim text.